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Electron Beam Lithography Technology SOI
imec
MedPhab partner
[TECHNICAL] TECHNICAL SERVICES
Photonic components
PHOTONIC COMPONENTS [Integrated circuits] Silicon photonics
PC1 Integrated circuits
Silicon photonics
Imec offers flexible technology for fast prototyping and verifying design ideas with sample sizes up to 3 cm x 4 cm. Top Si guiding layer is 400 nm. Some examples of the devices that can be fabricated with e-beam are simple waveguides
Electron Beam Lithography Technology (e-beam writing) for SOI
Waveguide loss (@1550 nm) < 4 dB/cm
Bottom oxide layer 2 micron
Silicon guiding layer 400 nanometer
Sample dimensions < 3 x 4 cm x cm
Etch depth 180 nm
Grating period (fill factor 50%) 200 nm
Feature size ≤ 100 nm
Taper width ≤ 100 nm
Ring resonator (gap) ≤ 150 nm
Imec offers flexible technology for fast prototyping and verifying design ideas with sample sizes up to 3 cm x 4 cm. Top Si guiding layer is 400 nm. Some examples of the devices that can be fabricated with e-beam are simple waveguides
2
2 3
N/A
10 chips months
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