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Polymer photonics structures
Organization name
VTT-Technical Research Centre of Finland
Organization/department description
VTT is one of Europe’s leading research institutions, owned by the Finnish state. Our task is to advance the utilisation and commercialisation of research and technology in commerce and society.
Organisation is
MedPhab partner
Offering type
[TECHNICAL] TECHNICAL SERVICES
Offering block
Photonic components
Technology
PHOTONIC COMPONENTS [Integrated circuits] Polymer photonics
Photonic Components
PC1 Integrated circuits
PC1 Integrated circuits
Polymer photonics
PC2 Microoptics
PC3 Fiberoptics
PC4 Opticalcomponents
PC5 Active components
Non Photonic Peripherals
NP1 Electronics
NP2 Optomechanics
NP3 Microfluidics
NP4 MEMS
Integration
IN1 Fiber/waveguide coupling
IN2 Optical assembly
IN3 Component assembly
IN4 Surface activation
Post-Processing
PP1 Over moulding
PP2 Hermetic sealing
PP3 Opto fluidic interface
PP4 Thin film deposition
Development support
Non technical services
Field of application
in vitro diagnostics
in vivo diagnostics
others
Target customers / applications
Technology provider
Manufacturer
Production services
Integrator
R&D
Consultancy
Equipment
Offering Description
Direct patterning of polymer photonics structures by combined nanoimprinting and lithography using modified mask aligner, hybrid mask mold and directly patternable, UV-curable materials. Patterning of structures is carried out in wafer-level fashion using VTT's Obducat Eitre? 6 nanoimprinting system and Karl Suss MA6 Mask Aligner.
Offering Reports
Offering specifications
Lithography mode
Vacuum
UV source
Mercury lamp
UV dose
300
mJ/cm2
Post-expo baking temperature
110
C
Hard-baking temperature
130
C
Stamp size
<152
mm
Substrate size
<152
mm
Stamp + substrate thickness
<5
mm
Imprint area (max)
152
mm
Imprint pressure (max)
80
bar
Imprint temperature (min)
Ambient
Imprint temperature (max)
200
C
Imprint temperature field uniformity
-3
%
Imprint temperature setting accuracy
-2
C
UV source
Mercury lamp
Wavelength
250-1000
nm
Exposure on sample (approx.)
25
mW/cm2
Alignment of transparent stamp
2 fiducials
Offering Reports description
Direct patterning of polymer photonics structures by combined nanoimprinting and lithography using modified mask aligner, hybrid mask mold and directly patternable, UV-curable materials. Patterning of structures is carried out in wafer-level fashion using VTT's Obducat Eitre? 6 nanoimprinting system
Version
TRL
1
2
3
4
MRL
1
2
3
4
ISO certification
ISO9001
Production volume
1-10
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